China Mechanical Engineering ›› 2011, Vol. 22 ›› Issue (3): 300-304.

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Research on Modeling Method of Relation between Abrasive Grain and Material Removal Depth

Wu Changlin;Ding Heyan;Chen Yi
  

  1. Huazhong University of Science and Technology, Wuhan, 430074
  • Online:2011-02-10 Published:2011-03-02

材料去除深度与磨粒的关系建模方法研究

吴昌林;丁和艳;陈义
  

  1. 华中科技大学,武汉,430074

Abstract:

It is assumed that abrasive grain is charactered by grit designation and structural number of an abrasive tool and it is cone shape with spherical tip, the distribution of the abrasive grain protrusion heights of the abrasive tool is Gaussian distribution and the nominal contact between the polishing tool and the wheel surface is of elliptical Hertzian contact, the actual contact pressure is proportional to the nominal pressure.A theoretical equation of MRD which is orthogonal to the tool path was derived and its solution process was introduced. MRD was involved with abrasive grain, normal polishing force, feed rate, the tangent relative velocity between polishing tool and wheel, and relative principal curvature. The experimental results agree well with the model,which verifies the theoretical model.
 

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摘要:

将粒度号和组织号作为刻画磨粒的两个基本参数,并假设磨粒出刃高度服从高斯分布、单颗磨粒为尖端球形的圆锥、抛光工具和工件的名义接触压力服从椭圆赫兹分布、磨粒和工件之间的实际接触压力与名义接触压力存在近似比例关系,推证了沿抛光轨迹在抛光点处的材料去除深度模型,并重点讨论了其求解过程。该模型表明材料去除深度与磨粒的粒度号和组织号、法向抛光力、进给速度、抛光工具和工件之间的切向相对速度以及相对主曲率等工艺参数相关。仿真和试验结果有较好的一致性,说明该建模方法是可行的。

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