Research on Chemical-assisted Magnetorheological Shear Thickening Polishing of Titanium Alloy Tube Inner Surfaces

doi:10.3969/j.issn.1004-132X.2025.12.005

Abstract

Abstract:

A magnetic shear thickening polishing method was proposed based on chemical assistance， and a novel polishing slurry was designed and prepared. A single-factor experiment was employed to study the impacts of H₂O₂ concentration， pH value， and surfactant concentration on the surface roughness of titanium alloy tube inner surfaces. Under the optimal conditions of 0.1% mass fraction H₂O₂ concentration， pH value of 5， and 0.3% mass fraction surfactant concentration， the value of surface roughness of titanium alloy tube inner surfaces is significantly reduced from 701 nm to 56 nm after 90 min polishing. Scanning electron microscopy and ultra-depth-of-field microscopy reveal that the chemical-assisted magnetorheological shear thickening polishing（CMSTP） may significantly remove the convex peaks and scratches generated during processing， resulting in a defect-free smooth surface.

Key words: titanium alloy tube, polishing, magnetorheological shear thickening, chemical-assisted, surface roughness, material removal rate

摘要：

提出基于化学辅助的磁性剪切增稠抛光方法，设计并制备了一种新型抛光液。采用单因素实验方案研究了H₂O₂质量分数、pH值和表面活性剂质量分数对钛合金（TA2）管内表面粗糙度的影响规律。在H₂O₂质量分数为0.1%、pH值为5和表面活性剂质量分数为0.3%的最佳条件下，经过90 min的抛光，钛合金管内表面的表面粗糙度Ra从701 nm降低至56 nm。扫描电镜和超景深显微镜观测发现，化学辅助磁性剪切增稠抛光方法能够显著减少加工过程中产生的凸峰和划痕，获得无缺陷的光滑表面。

关键词: 钛合金管, 抛光, 磁性剪切增稠, 化学辅助, 表面粗糙度, 材料去除率

CLC Number:

TH16

Zihao YANG, Zenghua FAN, Xiang ZHANG, Jun GAO. Research on Chemical-assisted Magnetorheological Shear Thickening Polishing of Titanium Alloy Tube Inner Surfaces[J]. China Mechanical Engineering, 2025, 36(12): 2846-2853.

杨自豪, 范增华, 张翔, 高军. 钛合金管内表面的化学辅助磁性剪切增稠抛光实验研究[J]. 中国机械工程, 2025, 36(12): 2846-2853.

Figures/Tables 14

Fig.1 Polishing principle of the CMSTP

Fig.2 Micro-scale polishing process in CMSTP

Fig.3 Force distribution of single abrasive in CMSTP process

Fig.4 Experimental device of CMSTP

Tab.1 Experimental parameters

参数名称	数值
工件转速/（r·min^-1）	1000
进给速度/（mm·min^-1）	100
H₂O₂质量分数/%	0.05，0.10，0.15
pH值	3，5，7，9
表面活性剂质量分数/%	0.1，0.3，0.5
测量时间/min	15，30，45，60，75，90
磨粒尺寸/μm	30
CIPs尺寸/μm	100
PHHP 质量分数/%	40
初始表面粗糙度Ra/nm	680~720
工件尺寸/mm	ϕ7×285
工件材料	TA2钛合金

Fig.5 The preparation process of CMSTPs

Fig.6 Microscopic image of CMSTPs

Tab.2 Composition parameters of polishing slurry

参数	CMSTPs	MSTPs
PHHP 质量分数/%	40	40
CIPs 质量分数/%	5	5
SiC 质量分数/%	15	15
去离子水质量分数/%	39.6	40
pH 值	5	7
H₂O₂质量分数/%	0.1
表面活性剂质量分数/%	0.3

Fig.7 Surface roughness and material removal mass variation with time

Fig.8 Effect of H2O2 mass fraction on surface roughness

Fig.9 Effect of pH value on surface roughness

Fig.10 Effect of surfactant mass fraction on surface roughness

Fig.11 SEM images of inner surface before and after CMSTP polishing

Fig.12 Surface morphology before and after CMSTP polishing

References 21

[1]	GAO K， ZHANG Y， JUN H， et al. Overview of Surface Modification Techniques for Titanium Alloys in Modern Material Science： a Comprehensive Analysis［J］. Coatings， 2024， 14（1）：148.
[2]	CARVALHO R S， HOROVISTIZ A， DAVIM P J. The Role of Roughness Parameters in Grading the Machined Surface Quality in Ti-alloys［J］. Proceedings of the Institution of Mechanical Engineers， Part B：Journal of Engineering Manufacture， 2024， 238（6/7）：1013-1029.
[3]	CHAUDHARI G S， HARNE S M P. A Review on Optimization of Machining Parameters in Cylindrical Grinding Process［J］. International Journal of Engineering Research and， 2015， 4（4）：684-686.
[4]	LUO H， AJMAL M， LIU W， et al. Polishing and Planarization of Single Crystal Diamonds：State-of-the-art and Perspectives［J］. International Journal of Extreme Manufacturing， 2021， 3（2）：49-91.
[5]	KUMAR R， KOMMA R. Development and Experimental Investigation of Magnetic Abrasive Finishing of 17-4PH Steel［J］. Proceedings of the Institution of Mechanical Engineers， Part C：Journal of Mechanical Engineering Science， 2024， 238（10）：4463-4476.
[6]	ZHANG J， WANG H. Magnetically Driven Internal Finishing of AISI 316L Stainless Steel Tubes Generated By Laser Powder Bed Fusion［J］. Journal of Manufacturing Processes， 2022， 76：155-166.
[7]	CAO C， ZHAO Y， ZHANG G， et al. Experimental Study of Plastic Cutting in Laser-assisted Machining of SiC Ceramics［J］. Optics and Laser Technology， 2024：169.
[8]	ZHANG Z， LIU J， HU W， et al. Chemical Mechanical Polishing for Sapphire Wafers Using a Developed Slurry［J］. Journal of Manufacturing Processes， 2021， 62：762-71.
[9]	LIAO L X， ZHANG Z Y， MENG F N， et al. A Novel Slurry for Chemical Mechanical Polishing of Single Crystal Diamond［J］. Applied Surface Science， 2021， 564：150431.
[10]	LYU B， HE K， CHEN H， et al. Experimental Study on Shear Thickening Polishing of Cemented Carbide Insert with Complex Shape［J］. The International Journal of Advanced Manufacturing Technology， 2019， 103（1/4）：585-595.
[11]	LI M， KARPUSCHEWSKI B， OHMORI H. High-efficiency Nano Polishing of Steel Materials［J］. Nanotechnology Reviews， 2021， 10：1329-38.
[12]	陈士豪，吕冰海，贺乾坤，等. 圆柱曲面剪切增稠抛光材料去除函数仿真与实验研究［J］. 表面技术， 2019， 48（10）：355-362.
	CHEN Shihao， Binghai LYU， HE Qiankun， et al. Simulation and Experimental Study on Material Removal Function of Shear Thickening Polishing Cylindrical Surface［J］. Surface Technology， 2019， 48（10）：355-362.
[13]	柯明峰，吕冰海，邵蓝樱，等. 硬质合金刀片前刀面的剪切增稠抛光实验研究［J］. 表面技术， 2022， 51（1）：220-228.
	KE Mingfeng， Binghai LYU， SHAO Lanying， et al. Experimental Study on Shearing Thickening Polishing of Rake Surface of Cemented Carbide Inserts［J］. Surface Technology， 2022， 51（1）：220-228
[14]	FAN Z， TIAN Y， ZHOU Q， et al. A Magnetic Shear Thickening Media in Magnetic Field-assisted Surface Finishing［J］. Proceedings of the Institution of Mechanical Engineers， Part B：Journal of Engineering Manufacture， 2020， 234（6/7）：1069-72.
[15]	FAN Z， TIAN Y， ZHOU Q， et al. Enhanced Magnetic Abrasive Finishing of Ti-6Al-4V Using Shear Thickening Fluids Additives［J］. Precision Engineering， 2020， 64：300-306.
[16]	FAN Z， TIAN Y， LIU Z Q， et al. Investigation of a Novel Finishing Tool in Magnetic Field Assisted Finishing for Titanium Alloy Ti-6Al-4V［J］. Journal of Manufacturing Processes， 2019， 43：74-82.
[17]	SUN Z， FAN Z， TIAN Y， et al. Post-processing of Additively Manufactured Microstructures Using Alternating-magnetic Field-assisted Finishing［J］. Journal of Materials Research and Technology， 2022， 19：1922-33.
[18]	LI J， FAN Z， YANG Z， et al. Simulation and Modeling of Magnetorheological Shear Thickening Polishing Processes for Slender Tube［J］. Journal of Materials Research and Technology， 2023， 25480-496.
[19]	SHINMURA T， TAKAZAWA K， HATANO E， et al. Study on Magnetic Abrasive Finishing［J］. CIRP Journal of Manufacturing Science and Technology， 1990， 39（1）：325-328.
[20]	ANDERSON D， WARKENTIN A， BAUER R. Simulation of Deep Spherical Indentation Using Eulerian Finite Element Methods［J］. Journal of Tribology， 2011， 133（2）：021401.
[21]	LEE H， JEONG H. A Wafer-scale Material Removal Rate Profile Model for Copper Chemical Mechanical Planarization［J］. International Journal of Machine Tools and Manufacture， 2011， 51（5）：395-404.