Contact States of Workpiece-Abrasive Particles-Polishing Pad in Cemented Carbide CMP Processes

doi:10.3969/j.issn.1004-132X.2021.17.008

Abstract

Abstract: Theoretical analysis of the contact states among workpiece， abrasive particles and polishing pads was carried out based on the theory of elastoplastic mechanics， the depth of the abrasive particles pressed into the workpieces under each contact states was calculated， and the mathematical model of the critical conditions of the contact states was established， and the verification experiments were conducted. The research results show that in the cemented carbide CMP processes， there are three forms of non-contact state， partial contact state， and full contact state among workpiece， abrasive particles and polishing pads. The depth of the abrasive particles pressed into the cemented carbide workpieces in the three contact states is mainly affected by the polishing load， the size of the abrasive particles and the hardness of soft layer of workpiece， and the critical conditions of each contact states are determined by the characteristics of the polishing pad， the mass fraction of abrasive particles， and the polishing load. The experimental results show that the established mathematical model is credible.

Key words: , cemented carbide, chemical mechanical polishing(CMP), contact state, pressed depth, critical condition

摘要： 基于弹塑性力学理论，对工件-磨粒-抛光垫间的接触状态进行理论分析，计算各状态下磨粒压入工件深度，建立接触状态临界条件的数学模型，并进行实验验证。研究结果表明：在硬质合金化学机械抛光过程中，工件-磨料-抛光垫间存在着非接触状态、部分接触状态和完全接触状态三种形式；不同接触状态下磨粒压入深度主要受抛光载荷、磨粒粒径以及工件表面软质层硬度影响，临界条件由抛光垫特性、磨粒质量分数以及抛光载荷共同决定。实验结果表明所建立的数学模型是可信的。

关键词: 硬质合金, 化学机械抛光, 接触状态, 压入深度, 临界条件

CLC Number:

TG175

MAO Meijiao, XU Qing, LIU Jingli, YUAN Julong, LI Min, HU Zihua. Contact States of Workpiece-Abrasive Particles-Polishing Pad in Cemented Carbide CMP Processes[J]. China Mechanical Engineering, 2021, 32(17): 2074-2081.

毛美姣, 许庆, 刘静莉, 袁巨龙, 李敏, 胡自化. 硬质合金化学机械抛光工件-磨粒-抛光垫接触状态研究[J]. 中国机械工程, 2021, 32(17): 2074-2081.

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