China Mechanical Engineering ›› 2013, Vol. 24 ›› Issue (07): 861-865.

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Line Spacing Optimization and Experimental Research of Gasbag Polishing with Continuous Precession

Jin Mingsheng;Ji Shiming;Zhang Li;Chen Weiqiang;Jiang Xinxin   

  1. Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology,Ministry of Education & Zhejiang Province, Zhejiang University of Technology,Hangzhou,310032
  • Online:2013-04-10 Published:2013-04-27
  • Supported by:
     
    National Natural Science Foundation of China(No. 50575208,51175471);
    Zhejiang Provincial Natural Science Foundation of China
    No. M503099,LQ12E05014)

连续进动气囊抛光行间距优化及实验研究

金明生;计时鸣;张利;陈伟强;蒋鑫鑫   

  1. 浙江工业大学特种装备制造与先进加工技术教育部/浙江省重点实验室,杭州,310032
  • 基金资助:
    国家自然科学基金资助项目(50575208,51175471);浙江省自然科学基金资助项目(M503099,LQ12E05014) 
    National Natural Science Foundation of China(No. 50575208,51175471);
    Zhejiang Provincial Natural Science Foundation of China(No. M503099,LQ12E05014)

Abstract:

In order to improve and control mould quality, simulation analysis and experimental research on line spacing optimization of gasbag polishing were made with continuous precession by line cutting method. On the basis of gaining the optimal feed rate and superposition times, simulation analysis of the effect on material removal characteristics of gasbag polishing regarding line spacing was carried out under MATLAB. Both the polishing efficiency and polishing quality were considered, and dichotomy theory was applied. Then, the optimal line spacing D=8.2mm was obtained. Finally, the simulation tallies well with experimental result, which are carried out on the established off-line planning prototype system of gasbag polishing with continuous precession. 

Key words: continuous precession, gasbag polishing, line spacing, off-line planning, optimization

摘要:

为提高和调控模具加工质量,针对行切法连续进动气囊抛光的行间距优化问题进行了仿真分析和实验研究。在取得优化进给速度和叠加次数的基础上,兼顾抛光效率与抛光效果,运用二分法原理,通过MATLAB仿真分析了行间距对气囊抛光材料去除特性的影响,获得了优化行间距D=8.2mm。基于建立的连续进动气囊抛光离线规划原型系统进行了实验对比验证,实验结果与仿真结果吻合。

关键词: 连续进动, 气囊抛光, 行间距, 离线规划, 优化

CLC Number: