真空原子氧辐照下MoS2/Zn薄膜的摩擦磨损性能

doi:10.3969/j.issn.1004-132X.2026.01.010

摘要/Abstract

摘要：

采用磁控溅射技术制备了MoS₂/Zn润滑薄膜，研究了原子氧MoS₂薄膜摩擦磨损性能的影响规律。结果显示，Zn的掺入促使MoS₂沿平行于（002）晶面的方向择优生长，薄膜结构致密有序，可有效抑制原子氧向薄膜内部侵蚀。转速2 r/min、MoS₂靶电流1.6 A、Zn靶电流0.3 A的MoS₂/Zn多层薄膜的摩擦因数为0.02、磨损率为1.9×10 $- 7$ mm³/（N·m）。原子氧环境中，MoS₂/Zn多层薄膜展示出更好的摩擦学性能，在6.12×10²⁰ atoms/cm²的辐照剂量下，MoS₂/Zn多层薄膜的平均摩擦因数降至0.01，其性能提升主要源于辐照产生的MeO _x 和MoS₂的协同作用。

关键词: 磁控溅射, 二硫化钼, 滑动摩擦磨损, 原子氧试验

Abstract:

MoS₂/Zn lubricating films were prepared by magnetron sputtering， and the influences of atomic oxygen on tribological properties of the films were investigated. Results show that Zn incorporation promotes the preferential growth of MoS₂ along the direction parallel to the （002） crystal plane， resulting in a dense and ordered film structure that effectively suppresse atomic oxygen erosion into the film. The friction coefficient of the MoS₂/Zn multilayer film is as 0.02 and the wear rate is as 1.9×10⁻⁷ mm³/（N·m） under atomic oxygen conditions （rotation speed is as 2 r/min， MoS₂ target current is as 1.6 A， and Zn target current is as 0.3 A）. The MoS₂/Zn multilayer films exhibite better tribological properties in atomic oxygen environment. Under an irradiation dose of 6.12×10²⁰ atoms/cm²， the average friction coefficient of the MoS₂/Zn multilayer film decreases to 0.01. This performance improvement mainly stemmed from the synergistic lubrication effects between MeO _x formed after irradiation and the residual MoS₂.

Key words: magnetron sputtering, MoS₂, sliding friction and wear, atomic oxygen test

中图分类号:

TH117

朱千业, 冯上郁, 史彦斌, 蒲吉斌. 真空原子氧辐照下MoS₂/Zn薄膜的摩擦磨损性能[J]. 中国机械工程, 2026, 37(1): 83-91.

ZHU Qianye, FENG Shangyu, SHI Yanbin, PU Jibin. Friction and Wear Properties of MoS₂/Zn Films under Vacuum Atomic Oxygen Irradiation[J]. China Mechanical Engineering, 2026, 37(1): 83-91.

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链接本文: https://www.cmemo.org.cn/CN/10.3969/j.issn.1004-132X.2026.01.010

https://www.cmemo.org.cn/CN/Y2026/V37/I1/83

图/表 12

图 1 薄膜沉积示意图

Fig.1 Schematic diagram of film deposition

图2 纯MoS2和MoS2/Zn薄膜的XRD谱图

Fig.2 XRD patterns of pure MoS2 and MoS2/Zn films

表1 薄膜的元素含量、厚度和表面粗糙度

Tab.1 The elemental composition， thickness， and surface roughness of the films

薄膜	原子百分数/%			粗糙度/nm	厚度/μm
薄膜	Mo	S	Zn	粗糙度/nm	厚度/μm
No.1	33..02	66.98		22.10	3.38
No.2	43.11	55.82	1.07	4.22	2.33
No.3	34.84	59.54	5.62	2.42	2.42
No.4	35.58	58.28	6.14	2.08	2.05

图3 薄膜的SEM图像和表面粗糙度及4号薄膜截面的TEM图像

Fig. 3 SEM images of the film， surface roughness， and TEM images of cross-section of film No. 4

图4 薄膜的力学性能

Fig.4 Mechanical properties of the films

图5 MoS2/Zn薄膜的摩擦磨损性能

Fig.5 Tribological properties of MoS2/Zn films

图6 三种薄膜摩擦副表面磨斑的光学形貌及相应的拉曼光谱

Fig.6 Optical morphology and corresponding Raman spectra of surface wear scars on three types of film friction pairs

图7 薄膜摩擦副表面磨斑的EDS图像

Fig.7 EDS images of wear scars on the friction pair surfaces of the films

图8 薄膜原子氧辐照前后的摩擦曲线

Fig.8 The friction curves of the films before and after atomic oxygen irradiation

图 9 4号薄膜的摩擦学性能

Fig.9 Tribological properties of the No.4 film

图10 原子氧辐照前后4号薄膜磨痕和磨斑标记处（在图9d中标记）的拉曼光谱及磨斑EDS图像

Fig.10 Raman spectra and EDS images of the wear scars and wear tracks（marked locations in Fig. 9d） on the No.4 film before and after atomic oxygen irradiation

图11 原子氧辐照下MoS2/Zn多层薄膜的摩擦机理图

Fig.11 Schematic diagram of friction mechanism of MoS2/Zn multilayer films under atomic oxygen irradiation

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真空原子氧辐照下MoS₂/Zn薄膜的摩擦磨损性能

Friction and Wear Properties of MoS₂/Zn Films under Vacuum Atomic Oxygen Irradiation

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