中国机械工程 ›› 2015, Vol. 26 ›› Issue (21): 2848-2852.

• 机械基础工程 • 上一篇    下一篇

分布式内冲液对多孔质电极电火花加工性能的影响

蒋毅1;孔令蕾1;李其1;平雪良1;赵万生2   

  1. 1.江南大学江苏省食品先进制造装备技术重点实验室,无锡,214122
    2.上海交通大学,上海,200240
  • 出版日期:2015-11-10 发布日期:2015-11-06
  • 基金资助:
    国家自然科学基金资助项目(51205169)

Influences  of  Distributed  Inner-flushing  on  Performance  of  Porous-electrode  EDM

Jiang Yi1;Kong  Linglei1;Li Qi1;Ping  Xueliang1;Zhao  Wansheng2   

  1. 1.Jiangsu Province Key Laboratory of Advanced Food Manufacturing Equipment and Technology,Jiangnan University, Wuxi, Jiangsu, 214122
    2.Shanghai Jiao Tong University,Shanghai,200240
  • Online:2015-11-10 Published:2015-11-06

摘要:

对分布式内冲液条件下的多孔质电极电火花加工性能进行了实验研究。实验结果表明,采用分布式内冲液方法能够达到充分降低极间蚀除产物浓度的目的,不仅可代替抬刀和平动方法,而且可采用较小的脉冲间隙以较大的占空比进行加工,获得较高的加工效率;对冲液流量影响的研究发现,随着冲液流量的增大,在冲液降低极间蚀除产物浓度和冲液干扰等离子体放电通道的双重作用下,加工材料去除率曲线变化呈现双峰值特征。通过获取极间电压和分析长连续开路时间对加工总时间的占比可知,冲液流量在增大过程中,首先使极间蚀除产物浓度降低至理想水平,再使等离子体通道扰动达到理想水平。

关键词: 电火花加工, 多孔质电极, 内冲液, 等离子体通道

Abstract:

The influences of  distributed inner-flushing  on performance of  porous-electrode  EDM were studied by a series of experiments. Experimental results show that the concentration of debris within discharge gap is able  to be reduced adequately by using distributed inner-flushing,such that the tool lifting and orbiting are able to be substituted.Furthermore,a tiny pulse interval can be applied and a high  material removal rate(MRR) is able to be achieved due to the high duty cycle.Experimental results also show that as the flushing flux increases,the MRR curve demonstrates a two peak-value characteristics,as a result of the dual roles of flushing on both debris evacuation and plasma channel disturbance.By means of acquiring gap voltage  and analyzing the proportion of long-term open-circuit  period to the whole machining time,it  is proved that,as the flux increases,the debris concentration is reduced to a ideal level firstly, and then a ideal level of plasma channel disturbance is achieved.

Key words: electrical , discharge machining(EDM);porous electrode;inner-flushing;plasma channel

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