端面滑动摩擦副接触界面波段发射率研究

摘要/Abstract

摘要： 为研究滑动摩擦过程中接触界面波段发射率的变化规律，设计并开展了一系列实验。以端面滑动摩擦副的接触界面为研究对象，在含二硫化钼的脂润滑条件下，开展定载荷、定转速实验，利用热像仪和自制装置测量了不同摩擦时间后的波段发射率，并根据发射率变化规律对红外测温仪测得的接触界面辐射亮温进行了修正。结果表明：测量装置能够较准确地实现摩擦接触界面波段发射率的测量；含有润滑脂和磨屑的接触界面发射率总体上在一定范围内波动，在摩擦过程中，具有先下降后上升的趋势；在稳定摩擦阶段，对辐射亮温的修正精度较高。

关键词: 端面滑动摩擦, 接触界面, 波段发射率, 热像仪, 辐射亮温

Abstract: In order to investigate the wideband emissivity changing rules of the sliding contact interfaces during the friction, a set of experiments were conducted. Taking the end-face sliding interface as the study object, its wideband emissivity after different friction times was measured using thermal imager and self-made device under constant load, constant velocity and molybdenum disulfide grease lubrication. The change regulation of the emissivity was used to correct the brightness temperature obtained by infrared thermometer. The measurement results of the wideband emissivity show a comparatively accurate ones of the self-made devices. The emissivity of the friction contact interface(with lubricating grease and abrasive dust) fluctuates within a certain range in general, and decreases firstly and then increases during the friction processes. The correction of the brightness temperature shows a high precision in the stable friction stage.

Key words: end-face sliding friction, contact interface, wideband emissivity, thermal imager, brightness temperature

中图分类号:

TH117.1

魏巍, 俞建卫, 王礼飞, 郜庚虎, 余晓芬. 端面滑动摩擦副接触界面波段发射率研究[J]. 中国机械工程.

Wei Wei, Yu Jianwei, Wang Lifei, Gao Genghu, Yu Xiaofen. Research on Wideband Emissivity of End-face Sliding Friction Pair Interfaces[J]. China Mechanical Engineering.

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